The main task attributed to IAP-MD in the project was be the fabrication of nanosheets of MoS₂ on SiO₂/Si, glass and GaN substrates and investigation of the optical properties of these 2D systems. In order to establish the optimal conditions of preparation and achieve the best results regarding their physical properties the fabrication of MoS₂ layers on GaN substrate was done by different methods. In order to reach the objective from many methods of fabrication, atomic layer deposition (ALD) and chemical vapour deposition (CVD) that consist of a controllable set of fabrication parameters for better results on reproducibility and characteristics of samples were chosen. IAP-MD completely mastered both methods and possessed all necessary equipment. The relevant laboratory rooms and all key equipment necessary for crystals and films growth by various methods, including furnaces with high precision controllers, an e-beam evaporator, magnetron sputtering and chemical vapor deposition installations, a glove-box, chemical baths, spin-coating and all necessary in situ and ex situ diagnostics for the determination of characteristic parameters of the obtained samples such as structure and thickness. Spectrometers with a high resolution, continuous wave and pulsed lasers with different emission wavelengths, high speed photodetectors, digital oscilloscopes, lock-in amplifiers and boxcar integrator, a closed cycle cryostat and the respective soft for the obtained data analysis were used to investigate optical properties of materials studied including optical absorption, steady-state and timeresolved photoluminescence spectra and decay time at different temperatures.